Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/121588
Kind Code:
A1
Abstract:
In order to enable independent control of both the node distribution and the center height distribution of the plasma density distribution, and thus make it possible to subject a sample to a plasma treatment having even more highly precise uniformity of treatment, this plasma treatment device is configured to include: a vacuum vessel in which a sample is subjected to plasma treatment; a high-frequency power source that supplies high-frequency power for generating plasma; a stage on which the sample is placed; and a magnetic field formation unit that forms a magnetic field inside the vacuum vessel, and is disposed outside of the vacuum vessel. The magnetic field formation unit is equipped with: a first coil; a second coil that is disposed inward of the first coil, and has a diameter smaller than the diameter of the first coil; a first yoke that covers the top and side surfaces of the first coil and the vacuum vessel, and has the first coil disposed therein; and a second yoke that covers the second coil along the circumferential direction of the second coil, and has an opening at the lower side of the second coil.
Inventors:
IWASE TAKU (JP)
ISOZAKI MASAKAZU (JP)
YOKOGAWA KENETSU (JP)
MORI MASAHITO (JP)
SAYAMA JUNICHI (JP)
ISOZAKI MASAKAZU (JP)
YOKOGAWA KENETSU (JP)
MORI MASAHITO (JP)
SAYAMA JUNICHI (JP)
Application Number:
PCT/JP2019/029630
Publication Date:
June 18, 2020
Filing Date:
July 29, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/3065
Foreign References:
| JP2019109980A | 2019-07-04 | |||
| JP2019061848A | 2019-04-18 | |||
| JP2005150606A | 2005-06-09 | |||
| JP2015201552A | 2015-11-12 | |||
| JP2008277773A | 2008-11-13 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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