Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/124470
Kind Code:
A1
Abstract:
In order to provide a plasma treatment device capable of achieving stable plasma treatment characteristics, said plasma treatment device has, in a sample stage that is arranged at a lower section in a treatment chamber inside a vacuum container and on which a wafer to be treated by using the plasma is placed, said wafer being placed on an upper surface of a protruding section arranged at an upper center section of the sample stage: an electrode that is arranged inside and that is supplied with high-frequency electrical power while the wafer is being treated, as well as an electrode of a ring-shaped member that is formed of a conductor and that is arranged so as to surround the upper surface at an outer circumferential side of the protruding section of the sample stage; a first ring-shaped cover, formed of a dielectric, that is arranged so as to cover the ring-shaped member between this ring-shaped member and the treatment chamber and between this ring-shaped member and an upper surface of the sample stage; and a second ring-shaped cover, formed of a conductor, that is arranged so as to cover an upper surface of the first ring-shaped cover between the treatment chamber and the upper surface of the first ring-shaped cover. The plasma treatment device is provided with an adjuster that, according to the detection result of the voltage of high-frequency electrical power supplied to the ring-shaped member formed of a conductor while the wafer is being treated, adjusts the magnitude of the high-frequency electrical power.

Inventors:
KAJIFUSA HIROYUKI (JP)
YOKOGAWA KENETSU (JP)
ARASE TAKAO (JP)
MORI MASAHITO (JP)
Application Number:
PCT/JP2019/049535
Publication Date:
June 24, 2021
Filing Date:
December 18, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H05H1/46; H01L21/3065
Foreign References:
JP2019192923A2019-10-31
JP2005303099A2005-10-27
JP2011108764A2011-06-02
JP2017055100A2017-03-16
JP2005064460A2005-03-10
Attorney, Agent or Firm:
IWASAKI Shigemi (JP)
Download PDF: