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Title:
POLYIMIDE RESIN COMPOSITION, POLYIMIDE VARNISH, AND POLYIMIDE FILM
Document Type and Number:
WIPO Patent Application WO/2021/039442
Kind Code:
A1
Abstract:
This polyimide resin composition includes: a polyimide resin (X) containing a repeating unit represented by formula (1) and a repeating unit represented by formula (2); and a fluorine-containing polymer (Y). (In formula (1), R1-R4 are each independently a monovalent aliphatic group or a monovalent aromatic group, Z1 and Z2 are each independently a divalent aliphatic group or a divalent aromatic group, r is a positive integer, and R5 is a tetravalent alicyclic group having 4 to 39 carbon atoms. In formula (2), R6 is a tetravalent alicyclic group having 4 to 39 carbon atoms, and Φ is a group which has total carbon atoms of 2-39 and which consists of a divalent aliphatic group, alicyclic group, aromatic group, or a combination thereof, and may have, as a linking group, at least one selected from the group consisting of -O-, -SO2-, -CO-, -CH2-, -C(CH3)2-, -C2H4O-, and -S-.)

Inventors:
MATSUMARU TERUHISA (JP)
OKADA KANA (JP)
SUENAGA SHUYA (JP)
Application Number:
PCT/JP2020/030894
Publication Date:
March 04, 2021
Filing Date:
August 14, 2020
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C08G73/10; C08L33/16; C08L79/08
Domestic Patent References:
WO2014073591A12014-05-15
WO2005061020A12005-07-07
Foreign References:
JP2006137796A2006-06-01
JP2019077863A2019-05-23
JPS57195149A1982-11-30
JPH03181558A1991-08-07
JP2019104843A2019-06-27
JP2020128521A2020-08-27
JP2019038930A2019-03-14
Attorney, Agent or Firm:
OHTANI PATENT OFFICE (JP)
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