Title:
POLYMER COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER
Document Type and Number:
WIPO Patent Application WO/2019/123761
Kind Code:
A1
Abstract:
A photosensitive resin composition which comprises two or more (meth)acrylic-acid-based polymers that have specific constituent units and differ from each other in acid value (mg-KOH/g), a solvent, a reactive diluent, and a photopolymerization initiator. The two or more (meth)acrylic-acid-based polymers contained in the photosensitive resin composition comprise a (meth)acrylic-acid-based polymer (a), which is the highest in acid value, and a (meth)acrylic-acid-based polymer (b), which has an acid value 0.01-0.50 times that of the (meth)acrylic-acid-based polymer (a). The (meth)acrylic-acid-based polymer (a) has a weight-average molecular weight of 1,000-10,000. The mass ratio of the (meth)acrylic-acid-based polymer (a) to the (meth)acrylic-acid-based polymer (b), (a)/(b), is 0.01-0.50.
Inventors:
HARA TSUKASA (JP)
KAWAGUCHI YASUAKI (JP)
KINOSHITA TAKEHIRO (JP)
YANAGI MASAYOSHI (JP)
KURAMOTO HIROKI (JP)
KAWAGUCHI YASUAKI (JP)
KINOSHITA TAKEHIRO (JP)
YANAGI MASAYOSHI (JP)
KURAMOTO HIROKI (JP)
Application Number:
PCT/JP2018/036330
Publication Date:
June 27, 2019
Filing Date:
September 28, 2018
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
C08L33/06; C08F2/44; C08F20/10; C08F265/06; G02B5/20; G03F7/004; G03F7/038
Foreign References:
| JP2014534460A | 2014-12-18 | |||
| JPH09278843A | 1997-10-28 | |||
| JP2017137483A | 2017-08-10 | |||
| JP2010145858A | 2010-07-01 | |||
| JP2008208184A | 2008-09-11 | |||
| JP2009244692A | 2009-10-22 | |||
| JP2000019731A | 2000-01-21 |
Attorney, Agent or Firm:
SOGA, MICHIHARU et al. (JP)
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