Title:
POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2008/015876
Kind Code:
A1
Abstract:
Disclosed are: a polymerizable compound having a fluorinated substituent (Z)
with the structure represented by the general formula (1), an adamantane structure
and a polymerizable group (A); a process for producing the polymerizable compound;
and a photoresist composition, a thermocurable resin composition or a photocurable
resin composition comprising a polymer produced by using the polymerizable
compound. In the filed of photolithography, by using the polymerizable compound
having an adamantane structure and the resin composition, it becomes possible
to reduce the permeability of a liquid immersion medium and improve the dry-etching
resistance in a liquid immersion exposure method and to reduce the adhesion to
a mold and improve the dry-etching resistance in a nanoimprint method. (1)
Inventors:
HATAKEYAMA NAOYOSHI (JP)
ONO HIDETOSHI (JP)
ITO KATSUKI (JP)
ONO HIDETOSHI (JP)
ITO KATSUKI (JP)
Application Number:
PCT/JP2007/063641
Publication Date:
February 07, 2008
Filing Date:
July 09, 2007
Export Citation:
Assignee:
IDEMITSU KOSAN CO (JP)
HATAKEYAMA NAOYOSHI (JP)
ONO HIDETOSHI (JP)
ITO KATSUKI (JP)
HATAKEYAMA NAOYOSHI (JP)
ONO HIDETOSHI (JP)
ITO KATSUKI (JP)
International Classes:
C07C69/653; C07C67/11; C07C67/29; C07C69/712; C08F16/24; C08F20/22; G03F7/039; H01L21/027
Foreign References:
| JP2004157321A | 2004-06-03 | |||
| JP2004069981A | 2004-03-04 | |||
| JP2006089412A | 2006-04-06 | |||
| JP2005054162A | 2005-03-03 | |||
| JPH06305044A | 1994-11-01 | |||
| JPH09302077A | 1997-11-25 | |||
| JPH0439665B2 | 1992-06-30 | |||
| JP2003100609A | 2003-04-04 | |||
| JP2005284238A | 2005-10-13 | |||
| JP2002184719A | 2002-06-28 |
Other References:
PROCEEDING OF SPIE, vol. 4691, 2002, pages 459 - 465
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (Bridgestone Toranomon Bldg. 6F,25-2, Toranomon 3-chom, Minato-ku Tokyo 01, JP)
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