Title:
POLYOLEFIN RESIN COMPOSITION FOR VAPOR DEPOSITION FILM, AND POLYOLEFIN FILM FOR VAPOR DEPOSITION COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2013/145359
Kind Code:
A1
Abstract:
Provided is a polyolefin resin composition for a vapor deposition film comprising: 60 to 90 weight parts of component (A), which is a polypropylene with a melt flow rate (MFRA) of 2 to 12 g/10 minutes measured at a temperature of 230°C and a load of 21.18 N; and 10 to 40 weight parts of component (B), which is a high-pressure method low density polyethylene with a melt flow rate (MFRB) of 15 to 100 g/10 minutes measured at a temperature of 190°C and a load of 21.18 N (the total amount of component (A) and component (B) in the composition is 100 weight parts).
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Inventors:
INOUE NAO (JP)
WANG NING (JP)
HIROTA TOMOO (JP)
WANG NING (JP)
HIROTA TOMOO (JP)
Application Number:
PCT/JP2012/070284
Publication Date:
October 03, 2013
Filing Date:
August 02, 2012
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
INOUE NAO (JP)
WANG NING (JP)
HIROTA TOMOO (JP)
INOUE NAO (JP)
WANG NING (JP)
HIROTA TOMOO (JP)
International Classes:
C08L23/12; B32B15/085; B32B27/32; C08L23/06
Foreign References:
JP2006256637A | 2006-09-28 | |||
JPS63179741A | 1988-07-23 | |||
JP2005059464A | 2005-03-10 | |||
JP2004292504A | 2004-10-21 | |||
JPH08217930A | 1996-08-27 | |||
JPH0392344A | 1991-04-17 | |||
JPS57147528A | 1982-09-11 |
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
Nakayama 亨 (JP)
Nakayama 亨 (JP)
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