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Title:
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC EL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/111424
Kind Code:
A1
Abstract:
Disclosed is a positive photosensitive resin composition which has high sensitivity and is suppressed in generation of residue during the development. The positive photosensitive resin composition is capable of forming a cured film that has a surface with excellent smoothness. Specifically disclosed is a positive photosensitive resin composition which is characterized by containing (component A) a resin that has a constituent unit represented by formula (1), a constituent unit having an acidic group and a constituent unit having a crosslinkable group, and (component B) an acid generator that has an oxime sulfonate group. In formula (1), R1 represents a hydrogen atom or an alkyl group; L1 represents a carbonyl group or a phenylene group; and R21-R27 each independently represents a hydrogen atom or an alkyl group.

Inventors:
KIKUCHI WATARU (JP)
YAMADA SATORU (JP)
SUGIHARA KOUICHI (JP)
SAKITA KYOUHEI (JP)
ISHIJI YOUHEI (JP)
Application Number:
PCT/JP2011/051084
Publication Date:
September 15, 2011
Filing Date:
January 21, 2011
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
KIKUCHI WATARU (JP)
YAMADA SATORU (JP)
SUGIHARA KOUICHI (JP)
SAKITA KYOUHEI (JP)
ISHIJI YOUHEI (JP)
International Classes:
G03F7/039; C08F212/14; C08F220/28; G02F1/1333; G03F7/004; H01L51/50; H05B33/22
Foreign References:
JP2011017921A2011-01-27
JP2011013118A2011-01-20
JP2010231074A2010-10-14
JP2008247780A2008-10-16
JPH11140411A1999-05-25
JPH10259203A1998-09-29
JPH10301283A1998-11-13
Attorney, Agent or Firm:
NOGUCHI YASUHIRO (JP)
Takahiro Noguchi (JP)
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Claims: