Title:
POSITIVE-TYPE PHOTORESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/063636
Kind Code:
A1
Abstract:
Provided is a positive-type photoresist composition characterized by comprising, as the essential component, a novolak-type phenol resin (C) that is obtained by condensing an aromatic compound (A) represented by general formula (1) or (2) with an aliphatic aldehyde (B). This positive-type photoresist composition can combine, at a high level, sensitivity and heat resistance, which have been difficult to combine in the past. Thus, the positive-type photoresist composition can be suitably used as a positive-type photoresist in the production of articles which necessitate the formation of finer patterns owing to the recent increase in the degree of integration, said articles including semiconductor devices such as IC and LSI, display devices such as LCD, and printing plate precursors. In the general formulae, R1, R2 and R3 are each independently C1-8 alkyl; m, n and p are each independently an integer of 0 to 4; q is an integer of 1 to (5-p); and s is an integer of 1 to (9-p).
Inventors:
IMADA TOMOYUKI (JP)
KAGE TAKAKAZU (JP)
IMAIZUMI NORIFUMI (JP)
KAGE TAKAKAZU (JP)
IMAIZUMI NORIFUMI (JP)
Application Number:
PCT/JP2011/074492
Publication Date:
May 18, 2012
Filing Date:
October 25, 2011
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
IMADA TOMOYUKI (JP)
KAGE TAKAKAZU (JP)
IMAIZUMI NORIFUMI (JP)
IMADA TOMOYUKI (JP)
KAGE TAKAKAZU (JP)
IMAIZUMI NORIFUMI (JP)
International Classes:
G03F7/023; C08G8/20
Foreign References:
| JPH0973169A | 1997-03-18 | |||
| JPH0561195A | 1993-03-12 | |||
| JP2008088197A | 2008-04-17 | |||
| JP2006113136A | 2006-04-27 | |||
| JPH0255359A | 1990-02-23 | |||
| JP2008088197A | 2008-04-17 | |||
| JPH0990626A | 1997-04-04 |
Other References:
See also references of EP 2639636A4
Attorney, Agent or Firm:
KONO MICHIHIRO (JP)
Michihiro Kono (JP)
Michihiro Kono (JP)
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Claims: