POWDER TREATMENT METHOD, POWDER TREATMENT DEVICE, AND METHOD OF MANUFACTURING POROUS GRANULATED MATTER

WIPO Patent Application WO/2004/112964

A1

A powder treatment device (100) having a deposition surface (3a) on which treated powder (50) is deposited and a treatment surface (5a) arranged opposite to the deposition surface (3a) and curved in a projected shape for efficiently manufacturing composite powder and porous granulated matter, comprising a moving means (16) moving the deposition surface (3a) and the treatment surface (5a) relative to each other along the deposition surface (3a), and an excitation treatment means (20) capable of providing an excitation energy from an excitation energy supply part (5a) arranged opposite to the deposition surface (3a) to the treated powder (50) deposited on the deposition surface (3a) or a vibration means (40) vibrating the deposition surface (3a) or the treatment surface (5a) along a direction crossing the deposition surface (3a).

JPH08266883	GRANULAR BODY COATING DEVICE AND METHOD THEREFOR
JP2007319780	WASTE TREATMENT APPARATUS AND WASTE GRANULATOR

NAITO MAKIO (JP)
ABE HIROYA (JP)
NOGI KIYOSHI (JP)
HOSOKAWA MASUO (JP)
FUKUI TAKEHISA (JP)
YOSHIKAWA MASAHIRO (JP)

PCT/JP2003/014485

December 29, 2004

November 13, 2003

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HOSOKAWA POWDER TECHNOLOGY RES (JP)
NAITO MAKIO (JP)
ABE HIROYA (JP)
NOGI KIYOSHI (JP)
HOSOKAWA MASUO (JP)
FUKUI TAKEHISA (JP)
YOSHIKAWA MASAHIRO (JP)

B01J2/12; B01J2/18; B02C19/08; B02C19/10; B02C19/18; B22F9/14; (IPC1-7): B02C19/18; B01J2/12; B01J2/18; B02C15/08

JPS63283767A	1988-11-21
JPS6342728A	1988-02-23
JPH05317679A	1993-12-03
JPH06134274A	1994-05-17
JPH03188935A	1991-08-16
JPH0838917A	1996-02-13

Kitamura, Shuichiro (Kita-ku Osaka-shi, Osaka, JP)

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