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Title:
PRESSURE CONTROL METHOD, TRANSFER DEVICE, AND CLUSTER TOOL
Document Type and Number:
WIPO Patent Application WO/2002/052638
Kind Code:
A1
Abstract:
A pressure control method, comprising the steps of sharing a dry pump (DP1) between cassette chambers (CC1) and (CC2) and a transfer chamber (TC), stopping the exhaust gas in the transfer chamber (TC) during the transfer of a wafer (W), and purging N¿2? in the transfer chamber (TC) only when gate valves (PG1, PG2) are opened, whereby treated materials can be fed from the cassette chambers to a process chamber while maintaining the pressure in the transfer chamber approximately at a constant, the control of the pressure in the transfer chamber during the transfer of the treated materials can be eliminated to integrate a supply and exhaust equipment, the amount of consumption of purge gas can be suppressed, and the cost and power consumption of the equipment can also be reduced.

Inventors:
KOIZUMI HIROSHI (JP)
ASAKAWA TAKASHI (JP)
AOKI TOSHIMITSU (JP)
Application Number:
PCT/JP2001/011338
Publication Date:
July 04, 2002
Filing Date:
December 25, 2001
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
KOIZUMI HIROSHI (JP)
ASAKAWA TAKASHI (JP)
AOKI TOSHIMITSU (JP)
International Classes:
B65G49/00; H01L21/00; H01L21/677; (IPC1-7): H01L21/68; B01J3/02; H01L21/302
Foreign References:
JPH11204508A1999-07-30
JPH10270527A1998-10-09
US5855681A1999-01-05
JPH07321047A1995-12-08
Attorney, Agent or Firm:
Suyama, Saichi (1 Kandata-cho 2-chome Chiyoda-ku, Tokyo, JP)
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