PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY

Title:

PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY

Document Type and Number:

WIPO Patent Application WO/2010/098352

Kind Code:

A1

Abstract:

A process for producing a porous quartz glass object which comprises hydrolyzing a precursor for a metallic dopant and a precursor for SiO2 in the flame from a burner to yield fine glass particles and depositing and growing the yielded fine glass particles on a substrate to produce the porous quartz glass object. The burner has at least two nozzles, and a mixed gas comprising (A) a metallic-dopant precursor gas, (B) an SiO2 precursor gas, (C) one of H2 and O2 gases, and (D) one or more gases selected from a group consisting of rare gases, N2, CO2, hydrogen halides, and H2O, the proportion of the gas(es) (D) being 5-70 mol%, and (E) the other of the H2 and O2 gases for (C) are respectively supplied to different nozzles of the burner.

Inventors:

MITSUMORI TAKAHIRO (JP)
IWAHASHI YASUTOMI (JP)
KOIKE AKIO (JP)

Application Number:

PCT/JP2010/052875

Publication Date:

September 02, 2010

Filing Date:

February 24, 2010

Export Citation:

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Assignee:

ASAHI GLASS CO LTD (JP)
MITSUMORI TAKAHIRO (JP)
IWAHASHI YASUTOMI (JP)
KOIKE AKIO (JP)

International Classes:

C03B8/04; C03B20/00; C03C3/06; G03F1/16; G03F7/20; H01L21/027

Domestic Patent References:

WO2006080241A2

2006-08-03

Foreign References:

JPS62252342A	1987-11-04
JPS59232932A	1984-12-27
JP2002220253A	2002-08-09
JP2006210404A	2006-08-10
JPS6324937B2	1988-05-23
JP2009040455A	2009-02-26

Other References: