Title:
PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2008/032510
Kind Code:
A1
Abstract:
A process for producing a semiconductor device which comprises heating a wiring
board having a chip and uncured adhesive layer superposed thereon to cure the
uncured adhesive layer, characterized by including a static pressing step in
which before the curing, the wiring board having a chip and uncured adhesive layer
superposed thereon is statically pressed at a pressure higher by at least 0.05
MPa than ordinary pressure. In the process for semiconductor device production,
voids can be easily eliminated regardless of board design and the adhesive is
prevented from curling up during the void-eliminating operation.
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Inventors:
YAMAZAKI OSAMU (JP)
ICHIKAWA ISAO (JP)
SAIKI NAOYA (JP)
ICHIKAWA ISAO (JP)
SAIKI NAOYA (JP)
Application Number:
PCT/JP2007/065418
Publication Date:
March 20, 2008
Filing Date:
August 07, 2007
Export Citation:
Assignee:
LINTEC CORP (JP)
YAMAZAKI OSAMU (JP)
ICHIKAWA ISAO (JP)
SAIKI NAOYA (JP)
YAMAZAKI OSAMU (JP)
ICHIKAWA ISAO (JP)
SAIKI NAOYA (JP)
International Classes:
H01L21/52; H01L21/60
Domestic Patent References:
WO2005004216A1 | 2005-01-13 |
Foreign References:
JP2003077953A | 2003-03-14 | |||
JP2001230528A | 2001-08-24 | |||
JP2002359264A | 2002-12-13 | |||
JP2005129502A | 2005-05-19 |
Other References:
See also references of EP 2063465A4
Attorney, Agent or Firm:
SUZUKI, Shunichiro (Gotanda Yamazaki Bldg. 6F13-6, Nishigotanda 7-chom, Shinagawa-ku Tokyo 31, JP)
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