Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PROCESS FOR REGENERATION OF PHOSPHORIC ACID CONTAINING ETCHANT FOR METALS OR PHOSPHORIC ACID
Document Type and Number:
WIPO Patent Application WO/2008/075636
Kind Code:
A1
Abstract:
The invention provides a process for regenerating efficiently a phosphoric acid containing etchant for metals which further contains volatile impurities such as volatile and hydrophilic etching inhibitor substances and other impurities such as metal ions into an etchant free from these impurities. The process comprises the step (1) of ridding a phosphoric acid containing etchant for metals which further contains at least one acid other than phosphoric acid and volatile and hydrophilic impurities of the volatile components by heating, vacuumization, blasting, or a combination of two or three of them and the step (2) of extracting metal ions from the residue obtained in the step (1) which contains phosphoric acid as the main component by the use of an extractant containing both a phosphoric monoester and a phosphoric diester.

Inventors:
SHIBATA JUNJI (JP)
NISHIJIMA YOSHITAKA (JP)
YASUE HIDEKUNI (JP)
YAMABE TAKASHI (JP)
MUKAI YOSHIHIRO (JP)
Application Number:
PCT/JP2007/074210
Publication Date:
June 26, 2008
Filing Date:
December 17, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NAGASE CHEMTEX CORP (JP)
SHIBATA JUNJI (JP)
NISHIJIMA YOSHITAKA (JP)
YASUE HIDEKUNI (JP)
YAMABE TAKASHI (JP)
MUKAI YOSHIHIRO (JP)
International Classes:
C23F1/46; B01D11/04; B01D19/00; C01B25/238
Foreign References:
JP2006315931A2006-11-24
JPH02149407A1990-06-08
JPS5677349A1981-06-25
JPS6325217A1988-02-02
JPS5479130A1979-06-23
Attorney, Agent or Firm:
FURUTANI, Shinya (1-27 Dojima 2-chome,Kita-ku, Osaka-shi, Osaka 03, JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: IMAGING DEVICE AND IMAGING SYSTEM

Next Patent: GAS FOR PLASMA REACTION, DRY ETCHING METHOD, AND METHOD FOR FORMING FLUOROCARBON FILM