Title:
PROCESSING METHOD AND PROCESSING DEVICE FOR GLASS SUBSTRATES, AND PRODUCTION METHOD FOR EUVL MASK BLANKS
Document Type and Number:
WIPO Patent Application WO/2021/229968
Kind Code:
A1
Abstract:
This processing method for glass substrates comprises: irradiating a first main surface of a glass substrate with a gas cluster in the form of a beam; moving the glass substrate so as to move the irradiation point of the gas cluster on the first main surface of the glass substrate; and using a shielding part that moves along with the glass substrate to block any anticipated fluid matter that would form defects on at least one of an end surface and a second main surface that faces the opposite direction of the first main surface of the glass substrate.
Inventors:
NARA TAKUMA (JP)
TAMURA MASAHIKO (JP)
YAMANA SATOSHI (JP)
TAMURA MASAHIKO (JP)
YAMANA SATOSHI (JP)
Application Number:
PCT/JP2021/015071
Publication Date:
November 18, 2021
Filing Date:
April 09, 2021
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C03C17/36; C03C23/00; G03F1/24; G03F1/60; G03F7/20
Domestic Patent References:
| WO2011115131A1 | 2011-09-22 |
Foreign References:
| JP2008156215A | 2008-07-10 | |||
| JP2016191952A | 2016-11-10 | |||
| JP2016038573A | 2016-03-22 | |||
| JP2018052804A | 2018-04-05 | |||
| JP2014125414A | 2014-07-07 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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