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Patent Searching and Data


Title:
RADIATION MEASURING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/002830
Kind Code:
A1
Abstract:
By the present invention, a thin radiation measuring apparatus equipped with sufficient signal volume is achieved. The radiation measuring apparatus 101 comprises a control device 301, a CCD camera 302, a housing 303, a mirror 304, and a fluorescent body 305. When a beam passes through the fluorescent body 305, fluorescent light is generated at the position where the beam has passed. The strength of the fluorescent light depends on the strength of the beam. The fluorescent light is reflected by the mirror 304 and ultimately observed by the CCD camera 302. The fluorescent body 305 is provided with a reflection preventing film 401 on the mirror-side surface thereof for preventing scattered light from being reflected by the fluorescent body 305 to be incident on the CCD camera 302. If scattered light 402 becomes incident on the reflection preventing film 401, one portion thereof is reflected by the surface of the fluorescent body 305 and another portion is reflected by the surface of the reflection preventing film 401 (reflection light 403A, 403B). The reflection light 403A and the reflection light 403B are in opposite phases and interfere with each other to cause a reduction in amplitude. Thus, the reflection preventing film 401 suppresses reflection of scattered light on the fluorescent body 305 to prevent the scattered light to be incident on the CCD camera 302.

Inventors:
TAKAYANAGI TAISUKE (JP)
Application Number:
PCT/JP2016/069194
Publication Date:
January 05, 2017
Filing Date:
June 29, 2016
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
G01T1/29; A61N5/10; G01T1/20
Foreign References:
JP2002365368A2002-12-18
JP2003130819A2003-05-08
JPH11231056A1999-08-27
JPH06221917A1994-08-12
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
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