RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Title:

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Document Type and Number:

WIPO Patent Application WO/2023/090129

Kind Code:

A1

Abstract:

This radiation-sensitive composition contains: a polymer having an acid dissociative group; and a compound represented by formula (1). In formula (1), R1 is a monovalent group having an aromatic ring structure and 5-20 carbons. R1 has an aromatic ring structure and is bonded to N-. R2 represents a monovalent organic group having 1-20 carbons. Mn+ represents an n-valent cation. n represents 1 or 2.

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Inventors:

ABE YUDAI (JP)
NEMOTO RYUICHI (JP)
OKAZAKI SATOSHI (JP)

Application Number:

PCT/JP2022/040451

Publication Date:

May 25, 2023

Filing Date:

October 28, 2022

Export Citation:

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Assignee:

JSR CORP (JP)

International Classes:

G03F7/038; G03F7/004; G03F7/039; G03F7/20

Domestic Patent References:

WO2022209733A1

2022-10-06

Foreign References:

JP2005208134A	2005-08-04
JP2002006482A	2002-01-09
JP2014149409A	2014-08-21

Attorney, Agent or Firm:

YAMADA, Tsuyoshi (JP)

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