Title:
RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/043506
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a radiation sensitive composition that has excellent LWR performance and sensitivity; and a pattern forming method. The present invention is a radiation sensitive composition that contains particles containing a metal oxide, cations containing a metal and anions each of which is a conjugate base of an acid, and wherein the pKa of the acid is 3 or less. The content of the particles is preferably 50% by mass or more, and more preferably 70% by mass or more in terms of solid content. The hydrodynamic radius of the particles as determined by dynamic light scattering analysis is preferably 10 nm or less. The total content of the cations and the anions per 100 parts by mass of the particles is preferably 5 parts by mass or more. The acid is preferably sulfonic acid, nitric acid, an organic azine acid, a disulfonylimide acid or a combination of these acids. The metal of the cations is preferably an element of group 2, group 3, group 4, group 5, group 6, group 7, group 8, group 9, group 10, group 11, group 12 or group 13.
Inventors:
SHIRATANI MOTOHIRO (JP)
Application Number:
PCT/JP2017/031011
Publication Date:
March 08, 2018
Filing Date:
August 29, 2017
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/20; G03F7/32
Domestic Patent References:
| WO2016111300A1 | 2016-07-14 | |||
| WO2016088655A1 | 2016-06-09 |
Foreign References:
| US20160231652A1 | 2016-08-11 | |||
| JP2001092116A | 2001-04-06 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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