Title:
RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/220878
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a radiation sensitive composition which is excellent in terms of pattern formability and scum suppression. The present invention is a radiation sensitive composition that contains particles, each of which has one or more first functional groups and is mainly composed of a metal oxide, a compound which has one or more second functional groups that are reactive with the first functional groups, and an organic solvent. It is preferable that one of the first functional group and the second functional group is an ethylenic carbon-carbon double bond-containing group, a protected or unprotected isocyanate group or a combination of these groups, while the other is a protected or unprotected sulfanyl group, a protected or unprotected amino group, a protected or unprotected hydroxy group or a combination of these groups; or alternatively, one of the first functional group and the second functional group is a carbon-carbon triple bond-containing group, while the other is an azide group.
Inventors:
SAKAI KAZUNORI (JP)
XU HONG
CHRISTOPHER K OBER
EMMANUEL P GIANNELIS
XU HONG
CHRISTOPHER K OBER
EMMANUEL P GIANNELIS
Application Number:
PCT/JP2019/017051
Publication Date:
November 21, 2019
Filing Date:
April 22, 2019
Export Citation:
Assignee:
JSR CORP (JP)
UNIV CORNELL (US)
UNIV CORNELL (US)
International Classes:
G03F7/004
Domestic Patent References:
| WO2018043506A1 | 2018-03-08 | |||
| WO2011040413A1 | 2011-04-07 | |||
| WO2017204090A1 | 2017-11-30 |
Foreign References:
| JP2003183537A | 2003-07-03 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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