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Title:
RADIATION-SENSITIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/158170
Kind Code:
A1
Abstract:
The present invention is a radiation-sensitive composition containing a resist base material (A), a diazonaphthoquinone optically active compound (B), and a solvent (C). The composition has a solid component content of 1%-80% by mass and a solvent content of 20%-99% by mass. The resist base material (A) is indicated by a prescribed formula.

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Inventors:
ECHIGO MASATOSHI (JP)
TOIDA TAKUMI (JP)
SATO TAKASHI (JP)
Application Number:
PCT/JP2016/056337
Publication Date:
October 06, 2016
Filing Date:
March 02, 2016
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
G03F7/022; C08G8/04
Domestic Patent References:
WO2005101127A12005-10-27
WO2015008560A12015-01-22
WO2013024778A12013-02-21
Foreign References:
JPH04296754A1992-10-21
JP2014199312A2014-10-23
JP2007206562A2007-08-16
JP2006098869A2006-04-13
JPH1097066A1998-04-14
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
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