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Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST
Document Type and Number:
WIPO Patent Application WO/2017/169866
Kind Code:
A1
Abstract:
This radiation-sensitive resin composition contains: an alkali-soluble resin (a) containing a novolac resin in a proportion of more than 70 mass%; a crosslinking component (b) that is the combination of a photoacid generator (b1) and an acid crosslinking agent (b2); a compound (c) that absorbs active radiation; and a basic compound (d).

Inventors:
ABE NOBUNORI (JP)
SATO NOBUHIRO (JP)
Application Number:
PCT/JP2017/010802
Publication Date:
October 05, 2017
Filing Date:
March 16, 2017
Export Citation:
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Assignee:
ZEON CORP (JP)
International Classes:
G03F7/038; G03F7/004; G03F7/20
Domestic Patent References:
WO2011102064A12011-08-25
Foreign References:
JP2002148788A2002-05-22
JP2006179423A2006-07-06
JP2005316412A2005-11-10
JP2005148391A2005-06-09
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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