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Title:
RADIATION SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD AND RADIATION SENSITIVE ACID GENERATOR
Document Type and Number:
WIPO Patent Application WO/2017/179727
Kind Code:
A1
Abstract:
The present invention is a radiation sensitive resin composition which contains a polymer having a first structural unit that contains an acid-cleavable group, a first radiation sensitive acid generator and a solvent, and wherein the first radiation sensitive acid generator is a first compound that has a first ring containing a bridge-like bond and at least two second rings that are fused with the first ring so as to share at least one side. The present invention is also a radiation sensitive resin composition which contains a polymer having a first structural unit that contains an acid-cleavable group, a first radiation sensitive acid generator and a solvent, and wherein the first radiation sensitive acid generator is a compound that is derived from a 1, 4-adduct of a compound having a carbon-carbon double bond or a carbon-carbon triple bond and -CO- or -SO2- to a compound represented by formula (A).

Inventors:
SHIRATANI Motohiro (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
Application Number:
JP2017/015389
Publication Date:
October 19, 2017
Filing Date:
April 14, 2017
Export Citation:
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Assignee:
JSR CORPORATION (9-2 Higashi-Shinbashi 1-chome, Minato-ku Tokyo, 40, 〒1058640, JP)
International Classes:
G03F7/004; C07C61/29; C07C62/06; C07C309/25; C07C309/27; C07C381/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
WO2015174215A12015-11-19
Foreign References:
JP2010155824A2010-07-15
JP2012229200A2012-11-22
JP2017102267A2017-06-08
JP2002128758A2002-05-09
JP2008308433A2008-12-25
Attorney, Agent or Firm:
AMANO Kazunori (6th Floor Fujikogyo-Nishimotomachi Building, 1-18, Aioi-cho 1-chome, Chuo-ku, Kobe-sh, Hyogo 25, 〒6500025, JP)
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