Title:
RADICAL POLYMERIZABLE COMPOSITION AND POLYMERIZED PRODUCT THEREOF
Document Type and Number:
WIPO Patent Application WO/2023/238925
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a radical polymerizable composition that is liquid and can form a resin of an ionomer structure easily. The present invention is a radical polymerizable composition that contains a water-immiscible radical polymerizable compound (A) and an anion represented by formula (1) (in the formula, R represents a C10 or fewer saturated or unsaturated hydrocarbon group.), in which the content of the anion is 1-120 mass parts per 100 mass parts of the water-immiscible radical polymerizable compound (A).
Inventors:
KANEKO TOMOMASA (JP)
INUBUSHI RYOSUKE (JP)
HIRAMA SUSUMU (JP)
INUBUSHI RYOSUKE (JP)
HIRAMA SUSUMU (JP)
Application Number:
PCT/JP2023/021512
Publication Date:
December 14, 2023
Filing Date:
June 09, 2023
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND (JP)
International Classes:
C08F220/04
Domestic Patent References:
| WO2012046787A1 | 2012-04-12 |
Foreign References:
| JP2014181252A | 2014-09-29 | |||
| JP2014182895A | 2014-09-29 | |||
| JP6638846B1 | 2020-01-29 | |||
| JP2018035310A | 2018-03-08 | |||
| JP2013216737A | 2013-10-24 |
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
Download PDF:
Previous Patent: SEMICONDUCTOR DEVICE AND IMAGING DEVICE
Next Patent: ELECTRODE STACK, METHOD FOR PRODUCING SAME AND ELECTROCHEMICAL ELEMENT
Next Patent: ELECTRODE STACK, METHOD FOR PRODUCING SAME AND ELECTROCHEMICAL ELEMENT