Title:
RADIO-SENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/043415
Kind Code:
A1
Abstract:
The present invention addresses the provision of a radio-sensitive resin composition in which lithographic performance such as LWR, MEEF, depth of focus (DOF) and sensitivity are balanced at high levels when forming a resist pattern. The present invention is a radio-sensitive resin composition containing [A] an acid generator consisting of a sulfonic acid derivative having one to three fluorine atoms, [B] an acid generator consisting of a sulfonic acid derivative having three to nine fluorine atoms and a greater number of fluorine atoms than the acid generator in [A], and [C] a polymer having an acid dissociation group. Either the acid generator in [A] and/or the acid generator in [B] is a compound represented by formula (1) below.
Inventors:
IKEDA MASATOSHI (JP)
SHIMIZU MAKOTO (JP)
SOYANO AKIMASA (JP)
SHIMIZU MAKOTO (JP)
SOYANO AKIMASA (JP)
Application Number:
PCT/JP2011/071727
Publication Date:
April 05, 2012
Filing Date:
September 22, 2011
Export Citation:
Assignee:
JSR CORP (JP)
IKEDA MASATOSHI (JP)
SHIMIZU MAKOTO (JP)
SOYANO AKIMASA (JP)
IKEDA MASATOSHI (JP)
SHIMIZU MAKOTO (JP)
SOYANO AKIMASA (JP)
International Classes:
G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| WO2009051088A1 | 2009-04-23 |
Foreign References:
| JP2010164958A | 2010-07-29 | |||
| JP2009169228A | 2009-07-30 | |||
| JP2006330325A | 2006-12-07 | |||
| JP2011186247A | 2011-09-22 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
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Claims: