Title:
REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK
Document Type and Number:
WIPO Patent Application WO/2021/085192
Kind Code:
A1
Abstract:
Provided are: a reflective mask having a coating film that is uniformly formed along an outermost surface and a side surface of a transfer pattern, and that has a high EUV transmittance and high washing resistance; and a production method for the reflective mask. For example, this reflective mask (10) is provided with: a substrate (1); a multilayer reflective film (2) that is formed on the substrate (1) and that reflects incoming EUV light; an absorbent layer (4) that is formed on at least a portion of the multilayer reflective film (2) and that absorbs incoming EUV light; and a coating film (5) that is formed on the multilayer reflective film (2) and the absorbent layer (4) and that transmits incoming EUV light. The coating film (5) has an extinction coefficient k of 0.04 or less with respect to EUV light, is resistant to washing with a washing chemical liquid, and is formed on the surface and the side surface of the absorbent layer (4) at a uniform thickness.
Inventors:
ICHIKAWA KENJIRO (JP)
GODA AYUMI (JP)
NAKANO HIDEAKI (JP)
GODA AYUMI (JP)
NAKANO HIDEAKI (JP)
Application Number:
PCT/JP2020/039173
Publication Date:
May 06, 2021
Filing Date:
October 16, 2020
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
G03F1/24; C23C16/30; C23C16/34; C23C16/40; C23C16/42; G03F1/82
Domestic Patent References:
| WO2006033442A1 | 2006-03-30 |
Foreign References:
| JP2003243292A | 2003-08-29 | |||
| US20150037544A1 | 2015-02-05 | |||
| US20190155138A1 | 2019-05-23 | |||
| US20190146331A1 | 2019-05-16 | |||
| JP2003318104A | 2003-11-07 | |||
| JP2003133205A | 2003-05-09 | |||
| JP2010192503A | 2010-09-02 | |||
| JP2019056898A | 2019-04-11 |
Other References:
See also references of EP 4053631A4
Attorney, Agent or Firm:
HIROSE Hajime et al. (JP)
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