Title:
REFLECTIVE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2013/108562
Kind Code:
A1
Abstract:
Provided is a novel reflective material having both excellent reflectivity and good antistatic performance. More preferably provided is a reflective material as mentioned above, which additionally has excellent heat resistance and excellent light-scattering performance.
Proposed is a reflective material characterized by having such a constitution that a resin layer (B) containing a polymer-type antistatic agent is provided on at least one surface of a resin layer (A) having voids formed therein, wherein the resin layer (B) is stretched in at least uniaxial direction at an areal magnification of 2 folds to 10 folds inclusive and the polymer-type antistatic agent is stretched and oriented in the inside of the layer (B).
Inventors:
WATANABE TAKAYUKI (JP)
KAWANO MASAHIKO (JP)
SATO NORIO (JP)
NOZAWA DAIKI (JP)
KAWANO MASAHIKO (JP)
SATO NORIO (JP)
NOZAWA DAIKI (JP)
Application Number:
PCT/JP2012/083900
Publication Date:
July 25, 2013
Filing Date:
December 27, 2012
Export Citation:
Assignee:
MITSUBISHI PLASTICS INC (JP)
International Classes:
B32B7/02; B32B5/18; F21V7/22; G02B1/10; G02B5/08; G02F1/13357
Domestic Patent References:
| WO2008053740A1 | 2008-05-08 | |||
| WO2008093623A1 | 2008-08-07 |
Foreign References:
| JP2007298678A | 2007-11-15 |
Attorney, Agent or Firm:
TAKEUCHI, ICHIZAWA & ASSOCIATES (JP)
Patent business corporation Takeuchi and an Ichizawa international patent firm (JP)
Patent business corporation Takeuchi and an Ichizawa international patent firm (JP)
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