Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2022/264941
Kind Code:
A1
Abstract:
A resist composition which contains: a resin component (A1) having a constituent unit (a01) that contains an acid-cleavable group represented by formula (a01-r); and an acid generator component (B) that contains a compound (B0) represented by formula (b0). In the formulae, Ra01
, and Ra02 represent saturated aliphatic hydrocarbon groups which may combine with each other to form an alicyclic group; Ra03 to Ra05 represent aliphatic hydrocarbon groups or the like, two or more of which may combine with each other to form an alicyclic group; X0 represents an iodine atom or the like; Rm represents a hydroxy group or the like; nb1 represents an integer of 1 to 5; nb2 represents an integer of 0 to 4; 1 ≤ nb1 + nb2 ≤ 5; Yb0 represents a divalent linking group or the like; Vb0 represents an alkylene group or the like; R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms, or the like; and Mm+ represents an m-valent organic cation.
Inventors:
ISHII SHUICHI (JP)
KATO HIROKI (JP)
NGUYEN KHANHTIN (JP)
IKEDA TAKUYA (JP)
ONISHI KOSHI (JP)
ODASHIMA RIN (JP)
FUJINAMI TETSUO (JP)
TODOROKI SEIJI (JP)
KAWATANI RYO (JP)
KATO HIROKI (JP)
NGUYEN KHANHTIN (JP)
IKEDA TAKUYA (JP)
ONISHI KOSHI (JP)
ODASHIMA RIN (JP)
FUJINAMI TETSUO (JP)
TODOROKI SEIJI (JP)
KAWATANI RYO (JP)
Application Number:
PCT/JP2022/023477
Publication Date:
December 22, 2022
Filing Date:
June 10, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
C07D327/06; C07D333/76; C08F220/12; C08F220/28; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| WO2021070590A1 | 2021-04-15 | |||
| WO2021039244A1 | 2021-03-04 |
Foreign References:
| JP2021067934A | 2021-04-30 | |||
| JP2021071720A | 2021-05-06 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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