Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2023/080138
Kind Code:
A1
Abstract:
Provided is a resist composition comprising a base material component (A), an acid generator component (B), and an acid diffusion controlling agent (D), wherein the acid generator component (B) includes a compound (B0) having a molar absorption coefficient of not more than 50,000 mol-1·L·cm-1 for an exposure light wavelength of 193 nm, and the acid diffusion controlling agent (D) includes a compound (D0) represented by general formula (d0). In the formula, Rd01 is, for example, a cyclic group that may have a substituent. Yd01 is a divalent linking group that includes an oxygen atom. m is an integer of 1 or higher, and Mm+ is an organic cation having a valence of m.
Inventors:
SOMEYA YASUO (JP)
KAIHO TAKAAKI (JP)
KAIHO TAKAAKI (JP)
Application Number:
PCT/JP2022/040894
Publication Date:
May 11, 2023
Filing Date:
November 01, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/039; G03F7/004; G03F7/20
Foreign References:
| JP2021089346A | 2021-06-10 | |||
| JP2016180843A | 2016-10-13 | |||
| JP2014209167A | 2014-11-06 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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