Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2023/140386
Kind Code:
A1
Abstract:
This resist composition contains: a resin component (A1) having a constituent unit (a1) that includes an acid-decomposable group the polarity of which increases under the action of acid, a constituent unit (a10) represented by general formula (a10-1), and a constituent unit (a5) represented by general formula (a5-1); and a resin component (Z) that has a constituent unit (z1) represented by general formula (z1-1) and that does not include an acid-dissociable group (where Wax1 is an aromatic hydrocarbon group, Ra5 is an acid non-dissociable aliphatic cyclic group in which some of the carbon atoms forming the ring skeleton may be substituted with an oxygen atom, and Rz0 is a hydrocarbon group that does not contain an acid-dissociable group or a hydrogen atom).
Inventors:
MIYAZAKI MASATO (JP)
HIRAYAMA FUMITAKE (JP)
KOHNO SHINICHI (JP)
NAKAGAWA YUSUKE (JP)
HIRAYAMA FUMITAKE (JP)
KOHNO SHINICHI (JP)
NAKAGAWA YUSUKE (JP)
Application Number:
PCT/JP2023/002003
Publication Date:
July 27, 2023
Filing Date:
January 24, 2023
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/039; G03F7/004
Domestic Patent References:
| WO2016035549A1 | 2016-03-10 | |||
| WO2018056369A1 | 2018-03-29 |
Foreign References:
| JP2018022039A | 2018-02-08 | |||
| JP2016164662A | 2016-09-08 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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