RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMERIC COMPOUND, AND COMPOUND

Title:

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMERIC COMPOUND, AND COMPOUND

Document Type and Number:

WIPO Patent Application WO/2019/065499

Kind Code:

A1

Abstract:

A resist composition containing a resin component (A1) of which the solubility in a developing solution can vary by the action of an acid, wherein the resin component (A1) has a constituent unit (a0) represented by general formula (a0-1) (in the formula, Ya01 and Ya02 independently represent a single bond or an alkylene group having 1 to 3 carbon atoms, wherein the total number of the carbon atoms in Ya01 and the carbon atoms in Ya02 is 3 or less; Ra01 and Ra02 independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, wherein the total number of the carbon atoms in Ra01 and the carbon atoms in Ra02 is 2 to 6 inclusive; and A' represents an alkylene group having 1 to 5 carbon atoms).

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Inventors:

TSUCHIYA JUNICHI (JP)
ENDO KOTARO (JP)
FUJISAKI MASAFUMI (JP)
NITO HIDETO (JP)

Application Number:

PCT/JP2018/035065

Publication Date:

April 04, 2019

Filing Date:

September 21, 2018

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)

International Classes:

G03F7/038; C08F20/38; G03F7/039; G03F7/20

Foreign References:

JP2013228664A	2013-11-07
JP2014152122A	2014-08-25

Attorney, Agent or Firm:

TANAI Sumio et al. (JP)

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