Title:
ROLL-TO-ROLL ATOMIC LAYER DEPOSITION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/169065
Kind Code:
A1
Abstract:
The present invention relates to an atomic layer deposition apparatus and, more particularly, to an atomic layer deposition apparatus for depositing an atomic layer on a flexible substrate. A roll-to-roll atomic layer deposition apparatus according to an embodiment of the present invention comprises: a casing that provides an internal space that retains a sealed state; a substrate transfer assembly which is provided in the inner space of the casing and includes a plurality of roll units; and a gas supply assembly which deposits an atomic layer on one surface and the other surface of the flexible substrate transferred by the substrate transfer assembly. The gas supply assembly comprises: an upper gas supply module facing the one surface of the substrate; and a lower gas supply module that is spaced apart from the upper gas supply module with the substrate interposed therebetween and faces the other surface of the substrate, wherein the upper gas supply module and the lower gas supply module include at least one purge gas supply unit, at least one reaction gas supply unit, and at least one source gas supply unit, which are arranged along the direction in which the substrate is transferred.
Inventors:
CHOI HAG YOUNG (KR)
KIM DONG WON (KR)
KIM SANG HUN (KR)
KIM KEUN SIK (KR)
KIM DONG WON (KR)
KIM SANG HUN (KR)
KIM KEUN SIK (KR)
Application Number:
PCT/KR2021/014852
Publication Date:
August 11, 2022
Filing Date:
October 21, 2021
Export Citation:
Assignee:
NEXUSBE CO LTD (KR)
International Classes:
C23C16/455; C23C16/54
Foreign References:
| KR20200086883A | 2020-07-20 | |||
| KR20180045200A | 2018-05-04 | |||
| KR20180115912A | 2018-10-24 | |||
| KR20140032316A | 2014-03-14 | |||
| KR20040101479A | 2004-12-02 | |||
| KR20200015962A | 2020-02-14 |
Attorney, Agent or Firm:
SUAN INTELLECTUAL PROPERTY (KR)
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