Title:
SAMPLE SURFACE QUALITY MANAGEMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/034067
Kind Code:
A1
Abstract:
Provided is a sample surface quality management device that measures the microroughness of a sample, the sample surface quality management device comprising a scattered light measurement device that measures scattered light produced at the sample, an interference light measurement device that measures interference light that includes reflected light produced at the sample, and a signal processing device that processes signals from the scattered light measurement device and the interference light measurement device. The signal processing device computes a first evaluation value for the microroughness of the sample on the basis of a signal from the interference light measurement device, computes a scattering characteristics signal on the basis of a signal from the scattered light measurement device, and computes, for a spatial frequency band for which the first evaluation value is not computed, a second evaluation value for the microroughness on the basis of the first evaluation value and the scattering characteristics signal.
Inventors:
ISHIZUKA MASATO (JP)
HONDA TOSHIFUMI (JP)
UKAI RYUJI (JP)
OHTSUBO KENSHIRO (JP)
HONDA TOSHIFUMI (JP)
UKAI RYUJI (JP)
OHTSUBO KENSHIRO (JP)
Application Number:
PCT/JP2022/030592
Publication Date:
February 15, 2024
Filing Date:
August 10, 2022
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/66; G01B11/30
Domestic Patent References:
| WO2014115586A1 | 2014-07-31 |
Foreign References:
| JP2006278972A | 2006-10-12 |
Attorney, Agent or Firm:
KAICHI IP (JP)
Download PDF: