Title:
SCANNING PROBE MICROSCOPE AND SAMPLE MEASUREMENT METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2015/133014
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a scanning probe microscope that removes the influence of thermal drift and achieves high measurement reproducibility even during measurement over a long period of time and a sample measurement method using this scanning probe microscope. The present invention provides "a sample measurement method using a scanning probe microscope characterized in that a sample surface is scanned using a probe supported by a cantilever, the leading end of the probe supported by the cantilever is caused to generate near-field light by the irradiation of excitation light onto the cantilever, a scattered light detection system is used to detect scattered near-field light from the sample surface, and the position or angle of the irradiation of the excitation light onto the cantilever or the positional relationship between the leading end of the probe and the scattered light detection system is corrected."
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Inventors:
BABA SHUICHI (JP)
NAKATA TOSHIHIKO (JP)
NAKATA TOSHIHIKO (JP)
Application Number:
PCT/JP2014/080841
Publication Date:
September 11, 2015
Filing Date:
November 21, 2014
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
G01Q60/18; G01Q10/06; G01Q60/22
Foreign References:
| JP2014013160A | 2014-01-23 | |||
| JP2005147745A | 2005-06-09 | |||
| JP2007163361A | 2007-06-28 | |||
| JP2005535878A | 2005-11-24 | |||
| JP2001153785A | 2001-06-08 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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