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Title:
SEMICONDUCTOR DEVICE AND METHOD FOR DESIGNING SAME
Document Type and Number:
WIPO Patent Application WO/2014/125994
Kind Code:
A1
Abstract:
There has been a problem of having semiconductor devices wherein measurement values as designed are not obtained even if optical proximity correction (OPC) is performed by forming dummy patterns. Disclosed is a semiconductor device wherein dummy patterns corresponding to respective gate patterns having different shapes are provided in a region having the gate patterns.

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JPH0262062MASTER SLICE TYPE SEMICONDUCTOR DEVICE
JPS62199045MANUFACTURE OF SEMICONDUCTOR DEVICE
JPS60233847SEMICONDUCTOR IC DEVICE
Inventors:
FUKUHARA NAOHIRO (JP)
NAGAMINE HISAYUKI (JP)
Application Number:
PCT/JP2014/052776
Publication Date:
August 21, 2014
Filing Date:
February 06, 2014
Export Citation:
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Assignee:
PS4 LUXCO SARL (LU)
FUKUHARA NAOHIRO (JP)
NAGAMINE HISAYUKI (JP)
International Classes:
H01L21/822; G06F17/50; H01L21/82; H01L21/8242; H01L27/04; H01L27/108
Foreign References:
JPH10200109A1998-07-31
JP2011171503A2011-09-01
JP2006228803A2006-08-31
JPS63211739A1988-09-02
JP2004039951A2004-02-05
JP2009182056A2009-08-13
JP2011238746A2011-11-24
JP2004022631A2004-01-22
Attorney, Agent or Firm:
IKEDA, Noriyasu et al. (JP)
Noriyasu Ikeda (JP)
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