Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/065463
Kind Code:
A1
Abstract:
The present invention comprises a strongly correlated material layer (9) provided between a source electrode (11) and a gate electrode (8) of a vertical MOSFET. This makes it possible, when heat generation occurs in an element during short circuiting, to cause the strongly correlated material layer (9) to function as a conductor and cause the gate and the source of the vertical MOSFET to electrically connect. Therefore, the voltage of the gate electrode (8) can be reduced and a short-circuit current flowing in the vertical MOSFET can be cut off, making it possible to minimize the power in the vertical MOSFET.

Inventors:
MITANI SHUHEI (JP)
IKEGAMI KATSUYA (JP)
SOEJIMA NARUMASA (JP)
Application Number:
PCT/JP2018/034875
Publication Date:
April 04, 2019
Filing Date:
September 20, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DENSO CORP (JP)
International Classes:
H01L29/78; H01L21/336; H01L29/06; H01L29/12
Domestic Patent References:
WO2016114057A12016-07-21
WO2018078894A12018-05-03
Foreign References:
JP2017507489A2017-03-16
JP2001177093A2001-06-29
Attorney, Agent or Firm:
YOU-I PATENT FIRM (JP)
Download PDF:



 
Previous Patent: SILICON CARBIDE SEMICONDUCTOR DEVICE

Next Patent: STRUCTURE