Title:
SENSOR SYSTEM AND INCLINATION DETECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/167533
Kind Code:
A1
Abstract:
In the present invention, detailed information regarding wafer inclination is specified by the presence or absence of inclination. A sensor system (1) is provided with a PLC (2) that specifies the inclination direction of a wafer (10) on the basis of a change in light quantity during a period in which a photoelectric sensor (6) detects the wafer (10) to be detected.
Inventors:
UENO SHINJI (JP)
KURIBAYASHI HIROSHI (JP)
YAMASHITA YOSHIHIRO (JP)
MURAKI SHIKOH (JP)
KURIBAYASHI HIROSHI (JP)
YAMASHITA YOSHIHIRO (JP)
MURAKI SHIKOH (JP)
Application Number:
PCT/JP2019/003300
Publication Date:
September 06, 2019
Filing Date:
January 31, 2019
Export Citation:
Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
International Classes:
H01L21/67; H01L21/673; H01L21/677
Foreign References:
| JP2016072458A | 2016-05-09 | |||
| JPH1050796A | 1998-02-20 | |||
| JP2000174095A | 2000-06-23 | |||
| JPH09283603A | 1997-10-31 | |||
| JP2012235058A | 2012-11-29 | |||
| JP2007324365A | 2007-12-13 | |||
| JPH04321253A | 1992-11-11 |
Attorney, Agent or Firm:
MURAKAMI, Takashi (JP)
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