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Title:
SENSOR SYSTEM AND INCLINATION DETECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/167533
Kind Code:
A1
Abstract:
In the present invention, detailed information regarding wafer inclination is specified by the presence or absence of inclination. A sensor system (1) is provided with a PLC (2) that specifies the inclination direction of a wafer (10) on the basis of a change in light quantity during a period in which a photoelectric sensor (6) detects the wafer (10) to be detected.

Inventors:
UENO, Shinji (801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
KURIBAYASHI, Hiroshi (801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
YAMASHITA, Yoshihiro (801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
MURAKI, Shikoh (801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
Application Number:
JP2019/003300
Publication Date:
September 06, 2019
Filing Date:
January 31, 2019
Export Citation:
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Assignee:
OMRON CORPORATION (801 Minamifudodo-cho, Horikawahigashiiru Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
International Classes:
H01L21/67; H01L21/673; H01L21/677
Foreign References:
JP2016072458A2016-05-09
JPH1050796A1998-02-20
JP2000174095A2000-06-23
JPH09283603A1997-10-31
JP2012235058A2012-11-29
JP2007324365A2007-12-13
JPH04321253A1992-11-11
Attorney, Agent or Firm:
MURAKAMI, Takashi (Daiwa Minamimorimachi Building 4F, 2-6 Tenjinbashi 2-chome Kita, Kita-ku, Osaka-sh, Osaka 41, 〒5300041, JP)
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