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Patent Searching and Data


Title:
A SHADOW MASK WITH TAPERED OPENINGS FORMED BY DOUBLE ELECTROFORMING USING POSITIVE/NEGATIVE PHOTORESISTS
Document Type and Number:
WIPO Patent Application WO/2017/132908
Kind Code:
A1
Abstract:
Disclosed are methods and apparatus for a shadow mask. A shadow mask (200), comprising: a frame (210) made of a metallic material, and one or more mask patterns (205) coupled to the frame (210), the one or more mask patterns (205) comprising a metal having a coefficient of thermal expansion less than or equal to about 14 microns/meter/degrees Celsius and having a plurality of openings (215) formed therein, the metal having a thickness of about 5 microns to about 50 microns and having borders (355) formed therein each defining a fine opening (215) having a recessed surface (370) formed on a substrate contact surface (375) thereof.

Inventors:
HUANG XI (CN)
LASSITER BRIAN E (US)
BENCHER CHRISTOPHER DENNIS (US)
HAAS DIETER (US)
Application Number:
PCT/CN2016/073374
Publication Date:
August 10, 2017
Filing Date:
February 03, 2016
Export Citation:
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Assignee:
APPLIED MATERIALS INC (US)
HUANG XI (CN)
International Classes:
C23C14/04; H01L51/56
Foreign References:
CN103866230B2016-01-20
CN204424321U2015-06-24
CN101096746B2014-05-28
TW201407267A2014-02-16
CN1804138A2006-07-19
CN105144421A2015-12-09
TW559876B2003-11-01
US20030113995A12003-06-19
Attorney, Agent or Firm:
LECOME INTELLECTUAL PROPERTY AGENT LTD. (CN)
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