Title:
A SHADOW MASK WITH TAPERED OPENINGS FORMED BY DOUBLE ELECTROFORMING
Document Type and Number:
WIPO Patent Application WO/2017/132907
Kind Code:
A1
Abstract:
Methods and apparatus (400) for a shadow mask are provided. A mask pattern (302) includes a mandrel (305) comprising a material having a coefficient of thermal expansion less than or equal to about 7 microns/meter/degrees Celsius with a conductive material formed thereon, and a dielectric material (310) having a plurality of openings (318) formed therein exposing at least a portion of the conductive material. The dielectric material (310) comprises a pattern of volumes， each of the volumes has a major dimension of about 5 microns to about 20 microns.
Inventors:
HUANG XI (CN)
LASSITER BRIAN E (US)
HAAS DIETER (US)
HONDA RYOGO (JP)
NAKASHIMA TAKASHI (JP)
LASSITER BRIAN E (US)
HAAS DIETER (US)
HONDA RYOGO (JP)
NAKASHIMA TAKASHI (JP)
Application Number:
PCT/CN2016/073372
Publication Date:
August 10, 2017
Filing Date:
February 03, 2016
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
HITACHI MAXELL (JP)
HUANG XI (CN)
HITACHI MAXELL (JP)
HUANG XI (CN)
International Classes:
C23C14/04
Foreign References:
| CN105177496A | 2015-12-23 | |||
| CN103572206A | 2014-02-12 | |||
| CN104498871A | 2015-04-08 | |||
| CN104404446A | 2015-03-11 | |||
| US20060007076A1 | 2006-01-12 |
Attorney, Agent or Firm:
LECOME INTELLECTUAL PROPERTY AGENT LTD. (CN)
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