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Title:
SHOWER PLATE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SHOWER PLATE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/073679
Kind Code:
A1
Abstract:
A shower plate according to the present disclosure comprises a ceramic sintered body, and is provided with: a first surface; a second surface opposed to the first surface; and a through-hole positioned between the first surface and the second surface. The shower plate has, on the inner surface of the through-hole, projected crystal particles projecting beyond an exposed part of a particle boundary phase existing between the crystal particles. A semiconductor manufacturing apparatus according to the present disclosure is configured by being provided with the shower plate.

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Inventors:
NOGUCHI YUKIO (JP)
KAWASE YUUJI (JP)
MATSUFUJI HIROMASA (JP)
TERAMOTO KOUJI (JP)
Application Number:
PCT/JP2016/081907
Publication Date:
May 04, 2017
Filing Date:
October 27, 2016
Export Citation:
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Assignee:
KYOCERA CORP (JP)
International Classes:
H01L21/31; C04B35/10; C23C16/455; H01L21/205; H01L21/3065
Foreign References:
JP2000228366A2000-08-15
JP2008208000A2008-09-11
JP2005093737A2005-04-07
JP2003045809A2003-02-14
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