SILANE-BASED RESINS THAT CAN BE PHOTOCHEMICALLY AND/OR THERMALLY STRUCTURED, SINGLE-STEP METHOD FOR THEIR PRODUCTION, PARENT COMPOUNDS AND PRODUCTION METHODS THAT CAN BE USED FOR SAID RESINS

Title:

SILANE-BASED RESINS THAT CAN BE PHOTOCHEMICALLY AND/OR THERMALLY STRUCTURED, SINGLE-STEP METHOD FOR THEIR PRODUCTION, PARENT COMPOUNDS AND PRODUCTION METHODS THAT CAN BE USED FOR SAID RESINS

Document Type and Number:

WIPO Patent Application WO2003031499

Kind Code:

A3

Abstract:

The invention relates to a silane resin that can be photochemically and/or thermally structured, obtained by at least the partial condensation of a mixture containing or consisting of (a) at least one silane compound of general formula (I), R>abSiX4-a-b, in which R represents a group that is subjected to radical or cationic polymerisation either photochemically and/or thermally by means of an organic group, R<2> represents a straight-chained, branched or cyclic, optionally substituted C1-C12 alkyl group, X can be identical or different and represents a leaving group, a stands for 1 or 2, b stands for 0 or 1 and a+b is not greater than 2, and (b) at least one silane diol of general formula (II), R<1>2Si(OH)2, in which R<1> can be identical or different and represents a straight-chained, branched or cyclic, optionally substituted C1-C12 alkyl group, or a group that is subjected to radical or cationic polymerisation either photochemically and/or thermally by means of an organic group, but not containing an aryl group. The invention also relates to a new production method for the silane diols used in this manner and to novel compounds from the silane diol group.

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Inventors:

FROEHLICH LOTHAR (DE)
JACOB STEPHANE (DE)
POPALL MICHAEL (DE)
HOUBERTZ-KRAUSS RUTH (DE)

Application Number:

PCT/EP2002/011160

Publication Date:

November 06, 2003

Filing Date:

October 04, 2002

Export Citation:

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Assignee:

FRAUNHOFER GES FORSCHUNG (DE)
FROEHLICH LOTHAR (DE)
JACOB STEPHANE (DE)
POPALL MICHAEL (DE)
HOUBERTZ-KRAUSS RUTH (DE)

International Classes:

C08G77/14; C08G77/20; (IPC1-7): C08G77/20; C08G77/14; C07F7/08

Foreign References:

DE19932628A1	2000-03-16
US6133466A	2000-10-17
US4528081A	1985-07-09
US5488125A	1996-01-30
US3965134A	1976-06-22
EP0544257A2	1993-06-02

Other References:

WALTER NOLL: "Chemie und Technologie der Silicone", VERLAG CHEMIE, 1968, XP002245746
DATABASE WPI Derwent World Patents Index; AN 1983-831107, XP002245747

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