Title:
SINGLE CRYSTAL PULL-UP DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/083899
Kind Code:
A1
Abstract:
The present invention provides a single crystal pull-up device wherein dopant supply means comprises: a feeding device disposed outside a chamber, whereby a dopant is housed and fed into the chamber; a sublimation room disposed inside the chamber, wherein the dopant fed from the feeding device is held and sublimated; a carrier gas introduction device for introducing a carrier gas into the sublimation room; and a spraying device for spraying the dopant sublimated in the sublimation room, along with the carrier gas, onto a starting material melt surface. The spraying device comprises a tube communicating with the sublimation room and a plurality of spray openings, and, via the tube, the sublimated dopant is dispersed from the plurality of spray openings to be sprayed onto the starting material melt surface. Thus, when doping with a sublimating dopant, the single crystal pull-up device is capable of efficient doping with the dopant in the shortest time possible.
More Like This:
JP2015008314 | METHOD OF PRODUCING EPITAXIAL WAFER AND EPITAXIAL WAFER |
JP5482547 | Method for manufacturing silicon single crystal |
WO/2017/017917 | SILICON SINGLE CRYSTAL GROWING METHOD |
Inventors:
SOETA SATOSHI (JP)
NAKAGAWA KAZUYA (JP)
NAKAGAWA KAZUYA (JP)
Application Number:
PCT/JP2017/033749
Publication Date:
May 11, 2018
Filing Date:
September 19, 2017
Export Citation:
Assignee:
SHINETSU HANDOTAI KK (JP)
International Classes:
C30B29/06; C30B15/04
Foreign References:
JP2011132043A | 2011-07-07 | |||
CN105369346A | 2016-03-02 | |||
JP2008266093A | 2008-11-06 | |||
JP2013129551A | 2013-07-04 | |||
JP2001342094A | 2001-12-11 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
Download PDF:
Previous Patent: MOTOR
Next Patent: WATER TREATMENT APPARATUS, WATER TREATMENT SYSTEM AND WATER TREATMENT METHOD
Next Patent: WATER TREATMENT APPARATUS, WATER TREATMENT SYSTEM AND WATER TREATMENT METHOD