SKIN CLEANSER COMPOSITION

Title:

SKIN CLEANSER COMPOSITION

Document Type and Number:

WIPO Patent Application WO/2016/002524

Kind Code:

A1

Abstract:

Provided is a skin cleanser composition which contains from 5% by mass to 30% by mass of (A) a polyoxyethylene alkyl ether sulfate ester salt, from 0.5% by mass to 3% by mass of (B) an alkyl dimethyl amine oxide, from 1.5% by mass to 5% by mass of (C) an aminoacetic acid betaine amphoteric surfactant, from 1% by mass to 3% by mass of (D) a polyoxyethylene-modified silicone or an amino-modified silicone, and from 0.02% by mass to 0.1% by mass of (E) at least one substance selected from among polyoxyethylene methyl glucoside dioleates and polyoxyethylene methyl glucoside trioleates, with the mass ratio (C/E) being from 20 to 200.

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Inventors:

IWAI TAKAO (JP)

Application Number:

PCT/JP2015/067501

Publication Date:

January 07, 2016

Filing Date:

June 17, 2015

Export Citation:

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Assignee:

LION CORP (JP)

International Classes:

A61K8/46; A61K8/40; A61K8/44; A61K8/60; A61K8/894; A61K8/898; A61Q19/10; C11D1/29; C11D1/74; C11D1/75; C11D1/90; C11D1/94; C11D3/37

Foreign References:

JP2014076975A	2014-05-01
JP2000129300A	2000-05-09

Attorney, Agent or Firm:

HIROTA, Koichi et al. (JP)
Koichi Hirota (JP)

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