Title:
SLURRY FOR SUSPENSION PLASMA SPRAYING, METHOD FOR FORMING RARE EARTH ACID FLUORIDE SPRAYED FILM, AND SPRAYING MEMBER
Document Type and Number:
WIPO Patent Application WO/2018/012454
Kind Code:
A1
Abstract:
Provided is a slurry for suspension plasma spraying, which is a spray material used for suspension plasma spraying in an atmosphere including an oxygen-containing gas, contains 5-40 mass% of rare earth fluoride particles having a maximum particle diameter (D100) of 12 μm or less, and contains one or more types of solvent selected from among water and organic solvents. A rare earth acid fluoride-containing sprayed film, in which process shift and particle generation hardly occur, can be stably formed on a base material by carrying out suspension plasma spraying in an atmosphere including an oxygen-containing gas. A spraying member provided with this sprayed film exhibits excellent corrosion resistance to halogen-based gas plasma.
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Inventors:
TAKAI YASUSHI (JP)
HAMAYA NORIAKI (JP)
HAMAYA NORIAKI (JP)
Application Number:
PCT/JP2017/025117
Publication Date:
January 18, 2018
Filing Date:
July 10, 2017
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C23C4/10; C01F17/218; C01F17/259; C01F17/265; C23C4/134
Domestic Patent References:
| WO2015019673A1 | 2015-02-12 |
Foreign References:
| JP2016089241A | 2016-05-23 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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