Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREFOR, AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/043654
Kind Code:
A1
Abstract:
This technology pertains to a solid-state imaging device that is capable of suppressing the generation of color mixing, a manufacturing method therefor, and an electronic apparatus. This solid-state imaging device is provided with a plurality of pixels arranged in a pixel region. Each of the pixels has: a first optical filter layer provided on a photoelectric conversion unit; a second optical filter layer provided on the first optical filter layer; and a separation wall that separates at least a portion of the first optical filter layer for each pixel. Either one of the first optical filter layer or the second optical filter layer corresponding to at least one pixel is formed by an infrared ray cut filter, while the other is formed by a color filter. This technology can be applied to a CMOS image sensor provided with visible light pixels.

Inventors:
NAKAJIKI SINTARO (JP)
SAYAMA YUKIHIRO (JP)
Application Number:
PCT/JP2017/031394
Publication Date:
March 08, 2018
Filing Date:
August 31, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01L27/146; G02B5/20; G02B5/22; H04N9/07
Domestic Patent References:
WO2014021115A12014-02-06
WO2016080003A12016-05-26
Foreign References:
JP2016146619A2016-08-12
JP2012227478A2012-11-15
JP2015046539A2015-03-12
JP2012226032A2012-11-15
JPH06217079A1994-08-05
JP2016076682A2016-05-12
Other References:
See also references of EP 3509106A4
Attorney, Agent or Firm:
NISHIKAWA Takashi et al. (JP)
Download PDF: