Title:
SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING SAME, AND ELECTRONIC INFORMATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/074007
Kind Code:
A1
Abstract:
A color filter can be formed by a simple manufacturing method and a low-light-level sensitivity can be improved by applying a bias to a pixel separation electrode. The solid-state imaging element includes a plurality of unit pixel portions arranged two-dimensionally on the front surface of the semiconductor substrate or the semiconductor layer and having light reception portions for generating signal charge when light is applied. Adjacent unit pixel portions (6) are formed by the same color so as to ease the requirements for color filter alignment accuracy. A pixel separation electrode (7) is formed in the adjacent unit pixel portions (6) so as to share the signal charge when a bias is applied in the low-light-level mode, thereby improving the effective photodiode area.
Inventors:
IWATA HIROSHI (JP)
Application Number:
PCT/JP2009/071180
Publication Date:
July 01, 2010
Filing Date:
December 18, 2009
Export Citation:
Assignee:
SHARP KK (JP)
IWATA HIROSHI (JP)
IWATA HIROSHI (JP)
International Classes:
H01L27/146; G02B5/20; H01L27/14; H04N5/335; H04N5/369; H04N5/374; H04N9/07
Foreign References:
| JP2008166780A | 2008-07-17 | |||
| JPH10256521A | 1998-09-25 | |||
| JP2005167958A | 2005-06-23 | |||
| JP2000078475A | 2000-03-14 |
Attorney, Agent or Firm:
YAMAMOTO Shusaku et al. (JP)
Shusaku Yamamoto (JP)
Shusaku Yamamoto (JP)
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