Title:
SOLID-STATE IMAGING ELEMENT AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2012/073402
Kind Code:
A1
Abstract:
This solid-state imaging element is provided with: a silicon substrate (2) which is provided with a plurality of photodiodes (3) that are arranged in a matrix; a transparent insulating layer (10) which is formed on the silicon substrate (2) and in which wiring lines (11, 12) are buried; a color filter layer (20) which is formed on the transparent insulating layer (10) and provided with color filters (21) that have colors predetermined with respect to respective photodiodes (3); and microlenses (14) which are formed on the color filter layer (20) so as to correspond to respective color filters (21). Color filers (21) of at least one color in the color filter layer (20) are formed to have a smaller area than the microlenses (14) when viewed in plan, and the color filers (21) of at least one color are surrounded by a low refractive index material (22) that has a lower refractive index than the color filers (21) in the color filter layer (20).
Inventors:
TERAI YUKA
NAKAGAWA ATSUO
NAKAGAWA ATSUO
Application Number:
PCT/JP2011/004340
Publication Date:
June 07, 2012
Filing Date:
July 29, 2011
Export Citation:
Assignee:
PANASONIC CORP (JP)
TERAI YUKA
NAKAGAWA ATSUO
TERAI YUKA
NAKAGAWA ATSUO
International Classes:
H04N5/369; H01L27/14
Domestic Patent References:
| WO2010122719A1 | 2010-10-28 | |||
| WO2006028128A1 | 2006-03-16 |
Foreign References:
| JP2006295125A | 2006-10-26 | |||
| JP2007147738A | 2007-06-14 | |||
| JP2007324321A | 2007-12-13 |
Attorney, Agent or Firm:
NAKAJIMA, Shiro et al. (JP)
Shiro Nakajima (JP)
Shiro Nakajima (JP)
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Claims: