SPECIMEN POTENTIAL MEASURING METHOD, AND CHARGED PARTICLE BEAM DEVICE

WIPO Patent Application WO/2011/007517

A1

In order to perform specimen charge measurement or focusing at high speed and with high accuracy even on a specimen in which fixed charge and induced charge may be mixedly present, provided is a specimen potential measuring method characterized by selectively measuring the potential of a specimen using a second specimen potential measuring device inside a specimen chamber when specimen potential information obtained by a first specimen potential measuring device provided outside the specimen chamber or a previously acquired specimen potential information is more than or equal to a predetermined threshold value, or more than the threshold value, and also provided is a device for implementing the method.

ISHIJIMA TATSUAKI (JP)
NASU OSAMU (JP)
FUKUDA MUNEYUKI (JP)
OHASHI TAKEYOSHI (JP)
YAMANASHI HIROMASA (JP)
MIYAMOTO TAKUJI (JP)
SAKAI KEI (JP)

PCT/JP2010/004346

January 20, 2011

July 02, 2010

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HITACHI HIGH TECH CORP (JP)
ISHIJIMA TATSUAKI (JP)
NASU OSAMU (JP)
FUKUDA MUNEYUKI (JP)
OHASHI TAKEYOSHI (JP)
YAMANASHI HIROMASA (JP)
MIYAMOTO TAKUJI (JP)
SAKAI KEI (JP)

H01J37/28; G01N23/225; H01J37/20; H01J37/21; H01L21/66

WO2003007330A1

2003-01-23

JP2005005151A	2005-01-06
JP2007194126A	2007-08-02
JP2010140733A	2010-06-24
JP2009277587A	2009-11-26
JP2009246012A	2009-10-22
JP2009026742A	2009-02-05
JP2008071492A	2008-03-27
JP2008064505A	2008-03-21
JP2007265833A	2007-10-11
JP2007053035A	2007-03-01

INOUE, Manabu et al. (JP)
Manabu Inoue (JP)

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