SPUTTERING TARGET CAPABLE OF DISCHARGING STEADILY - JX NIPPON MINING & METALS CORP

Title:

SPUTTERING TARGET CAPABLE OF DISCHARGING STEADILY

Document Type and Number:

WIPO Patent Application WO/2020/044573

Kind Code:

A1

Abstract:

Provided is a ferromagnetic material sputtering target which can achieve steady discharging with a magnetron sputtering device, is reduced in the generation of particles during sputtering, and has improved magnetic flux leakage. A sputtering target comprising (A) multiple metal particles each comprising Co or a Co alloy and (B) a composite phase in which Co or a Co alloy that fills gaps among the multiple metal particles and a metal oxide are dispersed in each other, wherein the difference between the Co concentration in the Co or the Co alloy constituting the multiple metal particles (A) and the Co concentration in the Co or the Co alloy constituting the composite phase (B) is 5 at% or less and the ratio of the area of the multiple metal particles to the total area of the multiple metal particles (A) and the composite phase (B) is 20 to 65%.

Inventors:

IWABUCHI YASUYUKI (JP)
OGINO SHIN-ICHI (JP)

Application Number:

PCT/JP2018/036507

Publication Date:

March 05, 2020

Filing Date:

September 28, 2018

Export Citation:

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Assignee:

JX NIPPON MINING & METALS CORP (JP)

International Classes:

C23C14/34

Domestic Patent References:

WO2011089760A1	2011-07-28
WO2011070850A1	2011-06-16

Foreign References:

JP2008223072A	2008-09-25
JP2011216135A	2011-10-27