Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SPUTTERING TARGET MEMBER, SPUTTERING TARGET ASSEMBLY, AND FILM FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/079856
Kind Code:
A1
Abstract:
Provided is a sputtering target member which is for a magnetic recording layer and can suppress the generation of particles. This sputtering target member for a magnetic recording layer contains 10-70 mol% of Co, 5-30 mol% of Pt, 1.5-10 mol% of carbide, and 0-30 mol% in total of one or two more non-magnetic materials selected from among carbon, oxide, nitride, and carbonitride.

Inventors:
KOSHO TAKASHI (JP)
IWABUCHI YASUYUKI (JP)
Application Number:
PCT/JP2022/035488
Publication Date:
May 11, 2023
Filing Date:
September 22, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
G11B5/851; C23C14/34; G11B5/65
Domestic Patent References:
WO2019220675A12019-11-21
WO2021014760A12021-01-28
WO2010110033A12010-09-30
Foreign References:
JP2018172770A2018-11-08
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: BIOLOGICAL SAMPLE MEASURING DEVICE

Next Patent: Fe-Pt-C-BASED SPUTTERING TARGET MEMBER, SPUTTERING TARGET ASSEMBLY, METHOD FOR FORMING FILM, AND MET...