Title:
Fe-Pt-C-BASED SPUTTERING TARGET MEMBER, SPUTTERING TARGET ASSEMBLY, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER
Document Type and Number:
WIPO Patent Application WO/2023/079857
Kind Code:
A1
Abstract:
Provided is a Fe-Pt-C-based sputtering target member which is prevented from the formation of particles during sputtering. The Fe-Pt-C-based sputtering target member has a magnetic phase containing Fe and Pt and a non-magnetic phase, the sputtering target member having a carbon-derived diffraction peak at a diffraction angle satisfying the formula: 25.6° ≤ 2θ ≤ 26.2° in an X-ray diffraction profile produced by the analysis of the sputtering target member by an X-ray diffraction method.
Inventors:
KOSHO TAKASHI (JP)
HORIE YUSUKE (JP)
HORIE YUSUKE (JP)
Application Number:
PCT/JP2022/035491
Publication Date:
May 11, 2023
Filing Date:
September 22, 2022
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; G11B5/851; H01F10/14
Domestic Patent References:
| WO2015076190A1 | 2015-05-28 | |||
| WO2014013920A1 | 2014-01-23 | |||
| WO2017154741A1 | 2017-09-14 | |||
| WO2014132746A1 | 2014-09-04 | |||
| WO2013190943A1 | 2013-12-27 |
Foreign References:
| JP2020180365A | 2020-11-05 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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