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Patent Searching and Data


Title:
STACKED PLATE TYPE EVAPORATOR
Document Type and Number:
WIPO Patent Application WO/2023/101028
Kind Code:
A1
Abstract:
The present invention is for controlling the drift of a first fluid (9) in a stacked plate type evaporator having a first fluid introduction path (7). A filter hole (5) is formed at an introduction path outlet (7b) of a first fluid introduction path (7) or at a first inlet (4a) of an end plate (4) connected to the introduction path outlet. A first fluid (9) is introduced into an introduction path inlet (7a) in a liquid-vapor two-phase flow. The total flow rate of the first liquid (9) at the filter hole (5) is a mass flow rate Gr (kg/hr) in a range 70 ≦ Gr ≦ 120. The flow rate of the first fluid (9) per one level of a first flow path (2) is a mass flow rate gr (kg/hr) in a range 5.8 ≦ gr ≦ 10. The flow path cross-sectional area a (mm2) of the filter hole (5) is in a range of 20 ≦ a ≦ 70.

Inventors:
KAWAMURA IICHIRO (JP)
SAKAI TAIJI (JP)
SUYAMA TAKAYUKI (JP)
TAKANO SHUNGO (JP)
Application Number:
PCT/JP2022/044643
Publication Date:
June 08, 2023
Filing Date:
November 25, 2022
Export Citation:
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Assignee:
T RAD CO LTD (JP)
International Classes:
F28F3/08; F28D9/02; F28F9/02
Foreign References:
JP2002340495A2002-11-27
KR20040103051A2004-12-08
Attorney, Agent or Firm:
KUBOTA Tabuki (JP)
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